Taking the medium of printmaking as a clue, the exhibition attempts to explore the interaction between technology and art media through the study of different art creation cases, presenting contemporary artists' exploration of the relationship between "craft and concept”.

Participating artists: Chuck Close, Anne Hamilton, Gary Hill, David Lynch, Qiu Zhijie, Su Xinping, Xu Bing, Zhu Jia, Chen Xiaowen.

Participating Printmaking Studios: 2RC Stamperia d'Arte (Italy), CHAO PrintMaking Studio (Beijing, China), The LeRoy Neiman Center for Prints Studies at Columbia University (USA), Stoney Road Press (Ireland), Tandem Press (USA), Institute for Electronic Arts at Alfred University (USA), Massachusetts College of Art and Design's Printmaking Studio (USA).

2017.11.18 – 2017.12.16 Academic Advisor: Yin Jinan Curator: Fei Jun, Chen Xiaowen Organizer: CHAO Art Center